# US 10,765,494 B2 · Titanium nano-scale etching on an implant surface

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- Number: US 10,765,494 B2
- Document ID: US10765494B2
- Status: Granted
- Kind: B2
- Application number: 16/222,231
- Filed: 2018-12-17
- Published: 2019-09-12
- Granted: 2020-09-08
- Earliest claimed: 2010-03-29
- Assignees: Biomet 3i, LLC
- Applicants: Biomet 3I, LLC
- Inventors: Robert L Mayfield; Ross W Towse
- Web page: https://patentgrep.com/patent/US10765494B2

## CPC

- A61C 8/0015: {being a conversion layer, e.g. oxide layer}
- A61C 8/00: Means to be fixed to the jaw-bone for consolidating natural teeth or for fixing dental prostheses thereon; Dental implants; Implanting tools (fastening of peg-teeth in the mouth A61C13/30)
- A61C 8/0012: {characterised by the material or composition, e.g. ceramics, surface layer, metal alloy (use of specific materials A61K6/00)}
- A61C 8/0013: {with a surface layer, coating}
- A61C 8/0022: {Self-screwing (A61C8/0028 takes precedence)}
- A61C 8/0037: {Details of the shape}
- A61C 13/00: Dental prostheses; Making same (tooth crowns for capping teeth A61C5/70; dental implants A61C8/00)
- A61L 27/04: Metals or alloys
- B82Y 30/00: Nanotechnology for materials or surface science, e.g. nanocomposites
- C23F 1/00: Etching metallic material by chemical means (manufacture of printing surfaces B41C; manufacture of printed circuits H05K)
- C23F 1/26: for etching refractory metals
- C23F 1/30: for etching other metallic material
- C23F 1/38: for etching refractory metals
- C23G 1/106: {refractory metals}
- A61C 2008/0046: {Textured surface, e.g. roughness, microstructure (A61C8/0013 takes precedence)}
- A61L 2400/18: Modification of implant surfaces in order to improve biocompatibility, cell growth, fixation of biomolecules, e.g. plasma treatment
- A61C: DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE (non-driven toothbrushes A46B; {tongue scrapers A61B17/24;} preparations for dentistry A61K6/00; preparations for cleaning the teeth or mouth A61K8/00, A61Q11/00)
- A61L: METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES (preservation of bodies or disinfecting characterised by the agents employed A01N; preserving, e.g. sterilising, food or foodstuffs A23; preparations for medical, dental or toiletry purposes A61K)
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- C23F: NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE (working metal by laser beams B23K26/00; desurfacing by applying flames B23K7/00; working of metal by electro-erosion B23H; producing decorative effects by removing surface material, e.g. by engraving, by etching, B44C1/22; electrolytic etching or polishing C25F); INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23G: CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS

## Abstract

A method of forming an implant to be implanted into living bone is disclosed. The method comprises the act of roughening at least a portion of the implant surface to produce a microscale roughened surface. The method further comprises the act of immersing the microscale roughened surface into a solution containing hydrogen peroxide and a basic solution to produce a nanoscale roughened surface consisting of nanopitting superimposed on the microscale roughened surface. The nanoscale roughened surface has a property that promotes osseointegration.

## Claims

### Claim 1

A method of forming an implant to be implanted into living bone, the method comprising:
acid etching at least a portion of the implant surface to produce a microscale roughened surface; and
treating the microscale roughened surface to provide a nanoscale topography superimposed on the microscale roughened surface, wherein treating the microscale roughened surface to include the nanoscale topography includes immersing the implant in a solution including hydrogen peroxide and a basic solution.

### Claim 2 (depends on 1)

The method of claim 1, wherein the basic solution is a potassium hydroxide solution.

### Claim 3 (depends on 1)

The method of claim 1, wherein the basic solution is a sodium hydroxide solution.

### Claim 4 (depends on 1)

The method of claim 1, wherein the nanoscale roughened surface includes nanopitting.

### Claim 5 (depends on 1)

The method of claim 1, further including:
depositing discrete nanoparticles on the nanoscale roughened surface, the nanoscale roughened surface including nanopitting.

### Claim 6 (depends on 1)

The method claim 1, wherein, prior to acid etching, the method includes:
removing the native oxide layer from least the portion of the implant surface.

### Claim 7

A method of forming an implant to be implanted into living bone, the method comprising:
roughening at least a portion of the implant surface to produce a dual microscale roughened surface including a first microscale surface having first peak-to-valley distances and a second microscale surface superimposed on the first microscale surface, the second microscale surface having second peak-to-valley distances that are less than the first peak-to-valley distances; and
treating the dual microscale roughened surface to provide a nanoscale topography superimposed on the dual microscale roughened surface.

### Claim 8 (depends on 7)

The method of claim 7, roughening at least the portion of the implant surface includes:
grit blasting the portion of the implant surface to form the first microscale surface.

### Claim 9 (depends on 8)

The method of claim 8, wherein the first peak-to-valley distances of the first microscale surface are about 10 microns to 30 microns.

### Claim 10 (depends on 8)

The method of claim 8, wherein roughening at least the portion of the implant surface includes:
acid etching the first microscale surface to form the second microscale surface superimposed on the first microscale surface.

### Claim 11 (depends on 10)

The method of claim 10, wherein the second peak-to-valley distances of the second microscale surface are less than 10 microns.

### Claim 12 (depends on 10)

The method of claim 10, wherein the second peak-to-valley distances of the second microscale surface are about 1 micron to about 3 microns.

### Claim 13 (depends on 10)

The method of claim 10, wherein the second microscale surface includes micropitting superimposed on the grit blasted surface.

### Claim 14 (depends on 7)

The method of claim 7, wherein treating the dual microscale roughened surface to include the nanoscale topography includes immersing the implant in a solution including hydrogen peroxide and a basic solution.

### Claim 15 (depends on 14)

The method of claim 14, wherein the basic solution is a potassium hydroxide solution.

### Claim 16 (depends on 14)

The method of claim 14, wherein the basic solution is a sodium hydroxide solution.

### Claim 17 (depends on 7)

The method of claim 7, wherein the nanoscale roughened surface includes nanopitting.

### Claim 18 (depends on 17)

The method of claim 17, further including:
depositing discrete nanoparticles on the nanoscale roughened surface.

### Claim 19 (depends on 7)

The method claim 7, wherein, prior to roughening at least the portion of the implant, the method includes:
removing the native oxide layer from at least the portion of the implant surface.
