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US 10,763,814 B2Granted
Radio frequency processing apparatus and method
AssigneeJohn Bean Technologies Corporation
InventorsRichard R. Brounley, Richard W. Brounley, Richard Timperio
Life of this patent
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Abstract
In an embodiment, an apparatus includes a radio frequency (RF) generator that is to generate a RF signal, first and second electrodes, and an impedance match module in series between the RF generator and the first electrode. The RF generator detects reflected power from the RF signal applied to a load electrically coupled between the first and second electrodes to change a temperature of the load, the RF signal to be applied to the load until the reflected power reaches a particular value.
Claims20
A system comprising:
- a plurality of radio frequency (RF) generators;
- a plurality of impedance match modules;
- a plurality of electrode plates, a first impedance match module and a second impedance match module of the plurality of impedance match modules being electrically coupled between a first RF generator and a second RF generator of the plurality of RF generators and a respective first electrode plate and a second electrode plate of the plurality of electrode plates;
- a plurality of direct current (DC) power sources and a master control module, wherein a first power source and a second DC power source of the plurality of DC power sources are electrically coupled to respectively the first RF generator and the second RF generator, and wherein the master control module is in communication with the first RF generator and the second RF generator;
- and
- a conveyor including a ground electrode,
- wherein, when a load at a start temperature is to be placed on the conveyor, the system uses RF signals generated by the plurality of RF generators to cause the load to be at an end temperature different from the start temperature, wherein the conveyor is to position the load to electrically couple to the first electrode plate during a first time period and the first impedance match module is associated with a first range of temperatures between the start and end temperatures, and wherein the conveyor is to position the load to electrically couple to the second electrode plate during a second time period and the second impedance match module is associated with a second range of temperatures between the start and end temperatures that is different from the first range of temperatures.
4 more elements
An apparatus comprising:
- means for positioning a load to electrically couple with a first electrode plate for a first time period, wherein a first means to match impedance is electrically coupled between the first electrode plate and a first radio frequency (RF) generator, and wherein the first means to match impedance is associated with a first range of temperatures between a start temperature and an end temperature associated with the load;
- means for applying a first RF signal to the load for a portion of the first time period during which the load is at a temperature within the first range of temperatures, the first RF signal comprising a RF signal generated by the first radio frequency RF generator and impedance matched by the first means to match impedance;
- means for positioning the load to electrically couple with a second electrode plate for a second time period, wherein a second means to match impedance is electrically coupled between the second electrode plate and a second RF generator, and wherein the second means to match impedance is associated with a second range of temperatures between the start and end temperatures different from the first range of temperatures;
- and
- means for applying a second RF signal to the load for a portion of the second time period during which the load is at a temperature within the second range of temperatures, the second RF signal comprising another RF signal generated by the second RF generator and impedance matched by the second means for matching impedance.
2 more elements
Dependencies are inferred from the claim text.