Opto-electronic device with textured surface and method of manufacturing thereof

A method of fabricating an optoelectronic device, the method comprising:

• providing a semiconducting substrate having a surface;
• forming a layered interface structure, said layered interface structure having a first surface in contact with said surface of said semiconducting substrate and said layered interface structure being configured to passivate said surface of said semiconducting substrate, said layered interface structure having a second surface and said layered interface structure being configured to electrically insulate said first surface from said second surface;
• forming a plurality of nanowires protruding from said second surface of said layered interface structure, said plurality of nanowires having a height comprised between 20 nanometers and 200 nanometers;
• and
• forming a transparent dielectric coating, having a thickness comprised between 20 nanometers and 200 nanometers, on the plurality of nanowires, the plurality of nanowires and the transparent dielectric coating forming a textured surface structure in contact with the second surface of the layered interface structure, so that said plurality of nanowires are fully embedded between said second surface of said layered interface structure and said transparent dielectric coating, so that said plurality of nanowires coated by said transparent dielectric coating having a height comprised between 20 nanometers and 200 nanometers.