Multi-row wiring member for semiconductor device and method for manufacturing the same

A multi-row wiring member configured of a plurality of wiring members arrayed in a matrix, each of the wiring members being used for manufacturing a semiconductor device, the multi-row wiring member including:

• a resin layer;
• a first plating layer, which is to become internal terminals, formed in the resin layer with lower faces thereof being uncovered at predetermined sites in a bottom surface of the resin layer;
• a plating layer that is to become wiring portions, connected with the first plating layer in the resin layer;
• and
• a second plating layer, which is to become external terminals, formed, in the resin layer on partial areas within areas of the plating layer that is to become wiring portions, with upper faces thereof being uncovered on a top-surface side of the resin layer,
• wherein a side view of each laminated piece of plating layers forming one of the internal terminals, one of the wiring portions, and one of the external terminals substantially has an L shape or an inverted T shape,
• wherein, on a bottom-surface side of the resin layer, a metal frame portion is formed at a site that is to be a margin around an aggregate of individual wiring members arrayed in the matrix,
• wherein the metal frame portion includes a metal sheet material having a frame shape and a bottom plating layer formed on an entirety of a bottom surface of the metal sheet material having the frame shape,
• wherein an entirety of a top surface of the metal sheet material of the metal frame portion is attached to the bottom surface of the resin layer without extending horizontally outside the resin layer, and
• wherein the bottom plating layer is configured of plating layers made of same metals and overlaid one on another in a same order as in the first plating layer and the plating layer that is to become wiring portions.