Substrate support unit, heat treatment unit, and substrate treating apparatus including the same
AssigneeSemes Co., Ltd.
InventorsMin Woo Jo, Cheolmin Choi, Sanguk Park, Man Kyu Kang
Life of this patent
Estimating the term…
Abstract
Embodiments of the inventive concept relate to a substrate treating apparatus. A substrate support unit configured to support a substrate includes a support plate, on which the substrate is positioned, the support plate may include a passage formed on an upper surface of the support plate and connecting a central area and a side surface of the support plate, and a recess formed in a peripheral area of the support plate and recessed inwards from a side surface of the support plate, and the recess may communicate with one end of the passage.
Claims19
A substrate support unit configured to support a substrate, the substrate support unit comprising:
- a support plate, on which the substrate is positioned,
- wherein the support plate includes:
- a passage formed on a first surface of the support plate and connecting a central area and a side surface of the support plate;
- and
- a recess formed in a peripheral area of the support plate and recessed inwards from the side surface of the support plate, and
- wherein
- the recess communicates with one end of the passage,
- the passage is recessed from the first surface of the support plate towards a second surface opposite the first surface,
- when viewed from the first surface, the width of the recess is larger than the width of the passage.
A substrate support unit configured to support a substrate, the substrate support unit comprising:
- a support plate, on which the substrate is positioned,
- wherein the support plate includes:
- a passage formed on a first surface of the support plate and connecting a central area and a side surface of the support plate;
- and
- a recess formed in a peripheral area of the support plate and recessed inwards from the side surface of the support plate, and
- wherein the recess communicates with one end of the passage,
- a side surface of the passage is inclined inwards as the passage extends from the first surface of the support plate to a second surface opposite the first surface.
A heating unit configured to heat a substrate, the heating unit comprising:
- a housing configured to provide a space in the interior thereof;
- a substrate support unit configured to support the substrate in the space and having a support plate, on which the substrate is positioned;
- and
- a temperature adjusting member configured to adjust the temperature of the substrate supported by the support plate,
- wherein the support plate includes:
- a passage formed on a first surface of the support plate and connecting a central area and a side surface of the support plate;
- and
- a recess formed in a peripheral area of the support plate and recessed inwards from the side surface of the support plate, and
- wherein
- the recess communicates with one end of the passage,
- the passage is recessed from the first surface of the support plate towards a second surface opposite the first surface,
- when viewed from the first surface, the width of the recess is larger than the width of the passage.
Dependencies are inferred from the claim text.