Recipe optimization based zonal analysis
AssigneeKLA-Tencor Corporation
InventorsRoie Volkovich, Michael Adel, Liran Yerushalmi, Eitan Herzel, Mengmeng Ye, Eran Amit
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Abstract
Metrology methods and modules are provided, which comprise carrying out recipe setup procedure(s) and/or metrology measurement(s) using zonal analysis with respect to respective setup parameter(s) and/or metrology metric(s). The zonal analysis comprises relating to spatially variable values of the setup parameter(s) and/or metrology metric(s) across one or more wafers in one or more lots. Wafer zones may be discrete or spatially continuous, and be used to weight one or more parameter(s) and/or metric(s) during any of the stages of the respective setup and measurement processes.
Claims13
A method comprising:
- carrying out a recipe setup procedure using zonal analysis with respect to at least one setup parameter, wherein the zonal analysis comprises spatially variable values of the at least one setup parameter across at least one wafer, wherein the zonal analysis is applied during a ranking phase of the recipe setup procedure, and wherein the zonal analysis is carried out with respect to concentric zones configured to distinguish at least a wafer center from wafer edges;
- and
- carrying out metrology measurements on the wafer with a metrology tool using the zonal analysis with respect to at least one metrology metric.
Dependencies are inferred from the claim text.