Substrate processing apparatus and methods with factory interface chamber filter purge
AssigneeApplied Materials, Inc.
InventorMichael R. Rice
Life of this patent
Estimating the term…
Abstract
Electronic device processing apparatus including factory interface chamber with environmental controls and a purge control apparatus allowing purge of a chamber filter. The filter purge apparatus includes a chamber filter and a flushing gas supply configured to supply flushing gas to the chamber filter when an access door to the factory interface chamber is open to allow personnel safe servicing access to the factory interface chamber. The supply of flushing gas to the chamber filter minimizes moisture contamination of the chamber filter by factory ambient air when the access door is open thereby allowing rapid resumption of substrate processing after factory interface servicing. Purge control methods and apparatus are described, as are numerous other aspects.
Claims27
A factory interface apparatus comprising:
- a plurality of walls forming a factory interface chamber, the plurality of walls comprising:
- a first wall having one or more load ports configured to dock one or more substrate carriers;
- and
- a second wall comprising an access door configured to facilitate personnel access into the factory interface chamber;
- an environmental control system coupled to the factory interface chamber and configured to supply a purge gas to control one or more environmental conditions within the factory interface chamber during substrate transfer through the factory interface chamber;
- a chamber filter configured to filter the purge gas provided to factory interface chamber;
- and
- a filter purge apparatus configured to supply a flushing gas to a portion of the factory interface chamber located upstream of the chamber filter when the access door is open in order to minimize moisture contamination of the chamber filter by ambient air, wherein the filter purge apparatus is configured to supply the flushing gas in association with the personnel access via the access door into the factory interface chamber or other breach of the factory interface chamber which compromises controlled environment of the factory interface chamber.
A chamber filter purge apparatus comprising:
- a factory interface chamber including an access door configured to facilitate personnel access into the factory interface chamber;
- a chamber filter configured to filter purge gas provided to the factory interface chamber;
- and
- a filter purge apparatus configured to supply a flushing gas to a portion of the factory interface chamber located upstream of the chamber filter when the access door is opened in order to minimize moisture contamination of the chamber filter from ambient air, wherein the filter purge apparatus is configured to supply the flushing gas in association with the personnel access via the access door into the factory interface chamber or other breach of the factory interface chamber which compromises controlled environment of the factory interface chamber.
A purge control method comprising:
- providing a factory interface chamber having an access door configured to provide personnel servicing access into the factory interface chamber;
- providing a chamber filter configured to filter a flow of purge gas supplied to the factory interface chamber;
- and
- supplying a flushing gas to a portion of the factory interface chamber located upstream of the chamber filter when the access door is open to minimize moisture contamination of the chamber filter by ambient air, wherein the flushing gas is to be supplied in association with the personnel servicing access via the access door into the factory interface chamber or other breach of the factory interface chamber which compromises controlled environment of the factory interface chamber.
Dependencies are inferred from the claim text.