Lithographic technique for feature cut by line-end shrink

A method of patterning a workpiece, the method comprising:

• patterning a hard mask based on a first set of features, wherein the patterning defines a linking feature within the hard mask;
• forming physically separated feature regions by depositing a spacer material on the linking feature;
• and
• selectively processing a portion of the workpiece using a pattern defined by the patterned hard mask layer and the spacer material.

A method of patterning a material layer, the method comprising:

• patterning a hard mask layer according to a first set of features, wherein the patterning defines a first feature and second feature connected by a line-end linking feature;
• physically separating the first feature from the second feature by depositing a spacing material on a sidewall of the line-end linking feature;
• and
• transferring to the material layer a pattern defined by the patterned hard mask layer and the spacing material.