Wastage determination method and plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsShu Kusano, Yusuke Hirayama
Life of this patent
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Abstract
There is provision of a method of determining wastage including: processing a substrate using a plasma generated by multiple gases including fluorine gas; obtaining light emission intensity of each gas of the multiple gases including fluorine gas from the plasma, by an optical emission spectrometer (OES); and calculating a wastage rate of a particular expendable part from the obtained light emission intensity of each gas of the multiple gases including fluorine gas, with reference to a storage section storing a wastage rate of the particular expendable part in association with the light emission intensity of each gas of the multiple gases including fluorine gas.
Claims17
A method comprising:
- supplying a fluorine containing gas and an oxygen containing gas into a chamber;
- forming a plasma from the fluorine containing gas and the oxygen containing gas in the chamber;
- measuring light emission intensities of fluorine radicals and oxygen radicals in the plasma by an optical emission spectrometer (OES);
- and
- determining a wastage rate of an expendable part in the chamber based on the measured light emission intensities of fluorine radicals and oxygen radicals and a look-up table, the look-up table including a relation between light emission intensitites of fluorine radicals and oxygen radicals and a wastage rate of the expendable part.
An apparatus comprising:
- a chamber;
- a gas inlet configured to supply a fluorine containing gas and an oxygen containing gas into the chamber;
- a plasma forming unit configured to form a plasma from the fluorine containing gas and the oxygen containing gas supplied into the chamber;
- an optical emission spectrometer (OES) configured to measure light emission intensitites of fluorine radicals and oxygen radicals in the plasma;
- an expendable part disposed in the chamber;
- a storage unit in which a look-up table is stored, the look-up table including a relation between light emission intensitites of fluorine radicals and oxygen radicals and a wastage rate of the expendable part;
- and
- a processor configured to determine a wastage rate of the expendable part based on the measured light emission intensitites of fluorine radicals and oxygen radicals and the look-up table.
Dependencies are inferred from the claim text.