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US 10,763,079 B1Granted
Focused ion beam impurity identification
AssigneeFEI Company
InventorsJeremy Graham, Lukas Kral
Life of this patent
Estimating the term…
Abstract
A dual beam system having a charged particle beam (CPB) lens and an ion beam column can operate in an analysis mode. In the analysis mode, an ion beam from the ion beam column can be deflected by the CPB into one or more component beams including a primary ion beam and one or more non-primary ion beams. The dual-beam system can identify the ion species of the non-primary ion beams.
Claims20
A system, comprising:
- a magnetic disperser configured to operate in an analysis mode;
- an ion beam column configured to direct an ion beam to a substrate,
- wherein in the analysis mode the magnetic disperser is energized to deflect the ion beam into one or more component beams;
- and
- wherein the magnetic disperser is a charged particle beam (CPB) magnetic lens coupled to a lens driver, wherein the CPB magnetic lens is further configured to operate in an imaging mode, wherein in the imaging mode the CPB magnetic lens is associated with imaging of the substrate, and wherein the CPB is an electron beam.
2 more elements
A system, comprising:
- a magnetic disperser configured to operate in an analysis mode and a zero mode;
- an ion beam column configured to direct an ion beam to a substrate;
- wherein in the analysis mode the magnetic disperser is energized to deflect the ion beam into one or more component beams;
- wherein the magnetic disperser is a magnetic stub, and
- wherein in the zero mode the magnetic stub is configured to mitigate remnant magnification to create a zero-field condition.
2 more elements
A method, comprising:
- directing an ion beam to a substrate;
- operating a magnetic disperser in an analysis mode with an analysis excitation to selectively deflect at least one beam component of the ion beam;
- identifying the at least one beam component based on the deflection;
- and
- wherein the magnetic disperser is a charged particle beam (CPB) magnetic lens and the CPB is an electron beam, further comprising determining the composition and magnitude of the at least one beam component identified based on the deflection.
2 more elements
A method, comprising:
- providing a dual-beam system that includes a scanning electron microscope (SEM) situated to image a substrate and a focused ion beam (FIB) source situated to direct an ion beam to the substrate, the SEM comprising a magnetic objective lens situated to direct an electron beam to the substrate to produce an image of the substrate based on auxiliary radiation from the substrate in response to the electron beam;
- activating an analysis mode of the magnetic objective lens to generate an analysis magnetic field;
- activating the ion beam column with the analysis mode active and milling at least one spot on the substrate;
- and
- determining one or more components of the ion beam based on deflection of the ion beam components.
2 more elements
Dependencies are inferred from the claim text.