Ion source, ion beam irradiation apparatus, and operating method for ion source
AssigneeNissin Ion Equipment Co., Ltd.
InventorTetsuro Yamamoto
Life of this patent
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Abstract
An ion source is provided. The ion source includes a plasma generation container, an electron supply, an electromagnet and a shift means. The plasma generation container generates an ion beam to be extracted therefrom in an ion beam extraction direction. The electron supply supplies electrons into the plasma generation container. The electromagnet generates a magnetic field for capturing the electrons from the electron supply. The shift means shifts a center of the magnetic field in the ion beam extraction direction to change a rate of a desired type of ion to be contained in the ion beam.
Claims15
An ion source comprising:
- a plasma generation container that generates a plasma from which an ion beam is extracted in an ion beam extraction direction;
- an electron supply that supplies electrons into the plasma generation container to generate the plasma;
- an electromagnet that generates a magnetic field for capturing the electrons from the electron supply;
- and
- shift means for shifting a center of the magnetic field in the ion beam extraction direction to change a rate of a desired type of ion to be contained in the ion beam.
A method of operating an ion source that includes a plasma generation container that generates a plasma from which an ion beam is extracted in an ion beam extraction direction;
- an electron supply that supplies electrons into the plasma generation container to generate the plasma;
- and an electromagnet that generates a magnetic field for capturing the electrons from the electron supply, the method comprising:
- shifting a center of the magnetic field in the ion beam extraction direction to change a rate of a desired type of ion to be contained in the ion beam.
An ion source comprising:
- a plasma generation container that generates a plasma from which an ion beam is extracted in an ion beam extraction direction;
- an electron supply that supplies electrons into the plasma generation container to generate the plasma;
- two electromagnets, disposed at opposite sides of the plasma generation container in a first direction that is orthogonal to an ion beam extraction direction, that generate a magnetic field for capturing the electrons from the electron supply;
- and
- a detachable magnetic shield attached to at least one of the two electromagnets.
Dependencies are inferred from the claim text.