Apparatus, system and techniques for mass analyzed ion beam

A system, comprising:

• an ion source, disposed to generate an ion beam;
• an electrodynamic mass analysis device, comprising:
• an entrance aperture, disposed to receive the ion beam;
• an exit aperture, disposed downstream to the entrance aperture, the entrance aperture and the exit aperture defining a beam axis, extending therebetween;
• an upper electrode assembly, disposed above the beam axis;
• and
• a lower electrode assembly, disposed below the beam axis;
• and
• a process chamber, disposed downstream of the exit aperture, the process chamber comprising a substrate stage;
• and
• an AC voltage assembly, electrically coupled to the upper electrode assembly and the lower electrode assembly.

A method of processing an ion beam, comprising:

• generating the ion beam as a continuous ion beam;
• directing the continuous ion beam along a beam axis into an electrodynamic mass analysis (EDMA) device, the EDMA device comprising an upper electrode assembly, disposed above the beam axis, and a lower electrode assembly, disposed below the beam axis;
• and
• conducting the continuous ion beam through the EDMA device while applying an AC voltage signal at a target frequency and a target voltage amplitude to the upper electrode assembly and to the lower electrode assembly,
• wherein a target ion species having a first mass exits the EDMA device along the beam axis, wherein an impurity ion species having a second mass, different from the first mass does not exit the EDMA device along the beam axis, and wherein a mass analyzed ion beam exits the EDMA device.