Compact high energy ion implantation system
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorFrank Sinclair
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Abstract
An apparatus may include an ion source, arranged to generate an ion beam at a first ion energy. The apparatus may further include a DC accelerator column, disposed downstream of the ion source, and arranged to accelerate the ion beam to a second ion energy, the second ion energy being greater than the first ion energy. The apparatus may include a linear accelerator, disposed downstream of the DC accelerator column, the linear accelerator arranged to accelerate the ion beam to a third ion energy, greater than the second ion energy.
Claims19
An apparatus, comprising:
- an ion source and extraction system, arranged to generate an ion beam at a first ion energy;
- a DC accelerator column, disposed downstream of the ion source, and arranged to accelerate the ion beam to a second ion energy, the second ion energy being greater than the first ion energy;
- and
- a linear accelerator, disposed downstream of the DC accelerator column, the linear accelerator arranged to accelerate the ion beam to a third ion energy, greater than the second ion energy.
A method for producing a high energy ion beam, comprising:
- generating an ion beam at an ion source at a low ion energy;
- accelerating the ion beam through a DC accelerator column to an intermediate ion energy, the intermediate ion energy being greater than 200 keV;
- and
- accelerating the ion beam in a linear accelerator, disposed downstream of the DC accelerator column, to a high energy, greater than 1 MeV.
A compact high energy ion implantation system, comprising:
- an ion source and extraction system, arranged to generate an ion beam at a first energy;
- a DC accelerator column, disposed downstream of the ion source, and arranged to accelerate the ion beam to an intermediate ion energy, the intermediate ion energy being greater than 200 keV;
- an analyzer, disposed downstream of the DC accelerator column, and arranged to alter a trajectory of the ion beam;
- and
- a linear accelerator, disposed downstream of the analyzer, the linear accelerator arranged to accelerate the ion beam to a high energy, greater than 1 MeV.
Dependencies are inferred from the claim text.