Pattern density analysis method
OwnerWei Cheng, Zhonghua Zhu +1inventors
InventorsWei Cheng, Zhonghua Zhu, Fang Wei
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Abstract
The present disclosure provides a pattern density analysis method for analyzing a local pattern density of a layout, the method comprising: obtaining a pattern attribute of each layout pattern located on a layout region to be analyzed; setting, for each layout pattern, a relevant window for the layout pattern based on the corresponding pattern attribute; calculating the pattern density of each relevant window; and selecting the maximum value of the pattern densities of the relevant windows as the maximum local pattern density of the layout, and selecting the minimum value of the pattern densities of the relevant windows as the minimum local pattern density of the layout.
Claims8
A pattern density analysis method for analyzing a local pattern density of a layout, the method comprising:
- obtaining a pattern attribute of each layout pattern located on a layout region to be analyzed in the layout;
- setting, for each layout pattern, a first relevant window and a second relevant window for the layout pattern based on a corresponding pattern attribute, with each layout pattern being located inside the first relevant window, and each layout pattern being located outside the second relevant window;
- calculating a pattern density of each first relevant window and each second relevant window;
- and
- selecting a maximum value of the pattern densities of all the first relevant windows as a maximum local pattern density of the layout, and selecting a minimum value of the pattern densities of all the second relevant windows as a minimum local pattern density of the layout.
Dependencies are inferred from the claim text.