Optical arrangement, in particular lithography system, with a transport lock

A system, comprising:

• a carrying frame;
• a mirror movable relative to the carrying frame;
• a vacuum housing having an interior space in which the mirror is disposed;
• a fixing device configured to fix the mirror relative to the carrying frame,
• wherein:
• the fixing device comprises a fixing element having an operating position and a fixing position;
• in its operating position, the fixing device is spaced apart from the mirror;
• in its fixing position, the fixing device abuts against the mirror;
• the fixing element is movable from the operating position into the fixing position by changing a pressure of the interior of the housing;
• the fixing element is movable from the fixing position to the operating position by changing the pressure of the interior of the housing;
• the fixing device has a gas volume sealed from the interior space of the housing;
• the system further comprises a further component;
• the further component is movable depending on a difference between the pressure of the interior of the housing and a pressure in the gas volume;
• the further component has its movement coupled to the fixing element, or the further component is the fixing element;
• and
• the system is an EUV lithography system.