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US 10,761,434 B2Granted
Substrate holding apparatus, exposure apparatus, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsShunya Sakata, Akihiro Takahashi, Noboru Osaka
Life of this patent
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Abstract
There is provided a substrate holding apparatus including a base provided with a gap and a reflection member disposed in the gap and configured to reflect light that has transmitted the substrate to the substrate side, and an exposure apparatus including the substrate holding apparatus.
Claims20
A substrate holding apparatus comprising:
- a base provided with a gap and configured to hold a substrate;
- and
- a reflection member disposed in the gap and configured to reflect light transmitting through the substrate towards the substrate,
- wherein a reflectance of the reflection member to the light that has transmitted the substrate is higher than a reflectance of the base to the light that has transmitted the substrate, and the reflectance of the reflection member is not less than 20%.
1 more element
An exposure apparatus comprising:
- a substrate holding apparatus including a base provided with a gap and configured to hold a substrate and a reflection member disposed in the gap and configured to reflect light that transmitting through the substrate to the substrate side,
- wherein the exposure apparatus transfers, in a state where the substrate having characteristics for transmitting exposure light is held by the substrate holding apparatus, a pattern of an original plate onto the substrate by using exposure light, and
- wherein a reflectance of the reflection member to the light transmitting through the substrate is higher than a reflectance of the base to the light transmitting through the substrate, and the reflectance of the reflection member is not less than 20%.
An article manufacturing method comprising:
- exposing a substrate to light by using an exposure apparatus for transferring a pattern of an original plate onto a substrate by using exposure light;
- and
- developing the exposed substrate,
- wherein the exposure apparatus comprises:
- a substrate holding apparatus including a base provided with a gap and configured to hold a substrate and a reflection member disposed in the gap and configured to reflect light transmitting through the substrate to a side of the substrate,
- wherein the exposure apparatus transfers, in a state where the substrate having characteristics for transmitting exposure light is held by the substrate holding apparatus, the pattern of the original plate onto the substrate by using exposure light, and
- wherein a reflectance of the reflection member to the light transmitting through the substrate is higher than a reflectance of the base to the light transmitting through the substrate, and the reflectance of the reflection member is not less than 20%.
4 more elements
Dependencies are inferred from the claim text.