Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsKoen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
Life of this patent
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Abstract
A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
Claims24
A substrate holder arranged to support a substrate, the substrate holder comprising:
- a support configured to support the substrate, the support comprising:
- a body having a first major side and a second major side opposing the first major side;
- a first set of one or more protrusions on the first major side, the first set of one or more protrusions configured to support the substrate;
- and
- a heat exchange device of the body, the heat exchange device configured to exchange heat with the body,
- wherein the body is configured to be removably supported on a support surface using a second set of one or more protrusions at the second major side.
A substrate table comprising:
- a support surface;
- and
- a support configured to support a substrate, the support comprising:
- a body having a first major side and a second major side opposing the first major side;
- and
- a first set of one or more protrusions on the first major side, the first set of one or more protrusions configured to support the substrate,
- wherein the support is removably supported on the support surface using a second set of one or more protrusions at the second major side;
- and
- a part of a linear encoder system configured to measure at least translation of the table, the part of the linear encoder system located horizontally outward of the support.
A substrate table comprising:
- a structure having a recess;
- a support configured to support a substrate, the support comprising:
- a body having a first major side and a second major side opposing the first major side;
- and
- a first set of one or more protrusions on the first major side, the first set of one or more protrusions configured to support the substrate,
- wherein the support is removably supported in the recess using a second set of one or more protrusions at the second major side.
A substrate holder arranged to support a substrate, the substrate holder comprising:
- a body made of SiSiC and having a first major side and a second major side opposing the first major side;
- a first set of one or more protrusions on the first major side, the first set of one or more protrusions configured to support the substrate;
- and
- a second set of one or more protrusions on the second major side, the second set of one or more protrusions configured to support the body on a surface.
Dependencies are inferred from the claim text.