Method to enhance the resolution of maskless lithography while maintaining a high image contrast

A computer system for enhancing the resolution of maskless lithography while maintaining a high image contrast on a substrate, comprising:

• a processor;
• and
• a memory storing instructions that, when executed by the processor, cause the computer system to:
• running an algorithm to provide different target polygons for forming a pattern on a target;
• determining a minimum feature size which may be formed by a DMD, wherein the minimum feature size is a function of the DMD mirror size and the hardware lens;
• determining to line bias or shot bias the one or more target polygons to achieve an acceptable exposure contrast at the target polygon boundary for each target polygons smaller than the minimum feature size, wherein line biasing comprises increasing the size of the target polygon and shot biasing comprises increasing the number of electromagnetic radiation shots in the target polygon;
• biasing the one or more target polygons smaller than the minimum feature size to form a digitized pattern on the substrate;
• and
• delivering a shot of electromagnetic radiation to reflect off of a first mirror of the DMD when the centroid for the first mirror is within the one or more target polygons.

A non-transitory computer-readable medium storing instructions that, when executed by a processor, cause a computer system to enhance the resolution of maskless lithography while maintaining a high image contrast on a substrate, by performing the steps of:

• running an algorithm to provide different target polygons for forming a pattern on a target;
• determining a minimum feature size which may be formed by a DMD, wherein the minimum feature size is a function of the DMD mirror size and the hardware lens;
• determining to line bias or shot bias the one or more target polygons to achieve an acceptable exposure contrast at the target polygon boundary for each target polygons smaller than the minimum feature size, wherein line biasing comprises increasing the size of the target polygon and shot biasing comprises increasing the number of electromagnetic radiation shots in the target polygon;
• biasing the one or more target polygons smaller than the minimum feature size to form a digitized pattern on the substrate;
• and
• delivering a shot of electromagnetic radiation to reflect off of a first mirror of the DMD when the centroid for the first mirror is within the one or more target polygons.