Photoresist and method of formation and use
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsKeng-Chu Lin, Joung-Wei Liou, Cheng-Han Wu, Ya Hui Chang
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Abstract
A system and method for depositing a photoresist and utilizing the photoresist are provided. In an embodiment a deposition chamber is utilized along with a first precursor material comprising carbon-carbon double bonds and a second precursor material comprising repeating units to deposit the photoresist onto a substrate. The first precursor material is turned into a plasma in a remote plasma chamber prior to being introduced into the deposition chamber. The resulting photoresist comprises a carbon backbone with carbon-carbon double bonds.
Claims21
A photoresist comprising:
- a polymer having a carbon backbone, wherein the polymer is located over a semiconductor substrate, wherein the carbon backbone comprises at least one linear section with a carbon-carbon double bond, wherein the carbon-carbon double bond is within the carbon backbone;
- one or more monomers attached to the carbon backbone, wherein a ratio of the carbon-carbon double bonds to carbon-carbon single bonds on the carbon backbone is greater than zero and less than about 40%;
- and
- a cross-linking agent, wherein the cross-linking agent is part of a compositional component of the photoresist.
A photoresist comprising:
- a polymer having a carbon backbone over an active device on a semiconductor substrate, wherein the carbon backbone comprises at least one linear section with a carbon-carbon double bond, wherein the carbon-carbon double bond is within the carbon backbone;
- and
- one or more monomers attached to the carbon backbone, wherein the photoresist has a structure of:
- where R1 represents a first one of the one or more monomers and R2 represents a second one of the one or more monomers different than the first one of the one or more monomers;
- and
- a protective layer over a photoresist polymer layer, the photoresist polymer layer comprising the carbon backbone.
A photoresist comprising:
- a polymer having a carbon backbone comprising at least one linear section with a carbon-carbon double bond, wherein the carbon-carbon double bond is within the carbon backbone;
- one or more monomers attached to the carbon backbone;
- a polymer bound photoacid generator bound to the carbon backbone;
- and
- a cross-linking agent, wherein the cross-linking agent is part of a compositional component of the photoresist.
Dependencies are inferred from the claim text.