Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition comprising a photoacid generator represented by General Formula (1-B),

• in General Formula (1-B), R1, R6, and R11 each independently represent an alkyl group, an alkylthio group, or a cyano group;
• R2 to R5, R7 to R10, and R12 to R15 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an acyl group, an alkyloxycarbonyl group, a cycloalkyloxycarbonyl group, an alkylthio group, an aryloxy group, an arylthio group, an aryloxycarbonyl group, an alkylaminocarbonyl group, a cycloalkylaminocarbonyl group, an arylaminocarbonyl group, a cyano group, a halogen atom, an amino group, a nitro group, a carboxyl group, or a hydroxyl group, R5 and R15 may be bonded to each other directly or via a linking group to form a ring, and
• Y− represents a non-nucleophilic anion.

An actinic ray-sensitive or radiation-sensitive resin composition comprising a resin having a repeating unit represented by General Formula (1-C),

• in General Formula (1-C), R20 to R22 each independently represents a hydrogen atom or a monovalent organic group, LA represents a single bond or a divalent linking group, and Z represents a group represented by General Formula (1-D),
• in General Formula (1-D), R1A, R6A, and R11A each independently represents a hydrogen atom, an alkyl group, an alkoxy group, an alkylthio group, a halogen atom, or a cyano group, at least one of R1A, R6A, and R11A represents a group other than a hydrogen atom, * represents a bonding position to La, and R7A to R10A and R12A to R15A each independently represents a hydrogen atom or a monovalent organic group, and Y− represents a non-nucleophilic anion.