Pellicle film for photolithography and pellicle

A pellicle for photolithography, comprising:

• a pellicle frame;
• and
• a pellicle film to be stretched over one end face of the pellicle frame,
• the pellicle film comprising a polymer film, and a gas impermeable layer formed on one side or both sides of the polymer film, wherein the polymer film comprises a fluorine resin.

A pellicle for photolithography, comprising:

• a pellicle frame;
• and
• a pellicle film to be stretched over one end face of the pellicle frame,
• the pellicle film comprising a polymer film, and a gas impermeable layer formed on one side or both sides of the polymer film, wherein
• a thickness of the gas impermeable layer is 0.2 to 1 nm, and accounts for 0.02 to 1% of the entire thickness of the pellicle film.

A pellicle film to be stretched over one end face of a pellicle frame for photolithography, comprising:

• a polymer film;
• and
• a layer containing graphene formed on one side or both sides of the polymer film, wherein
• the polymer film comprises a fluorine resin.

A pellicle for photolithography, comprising:

• a pellicle frame;
• and
• a pellicle film to be stretched over one end face of the pellicle frame,
• the pellicle film comprising a polymer film, and a layer containing graphene formed on one side or both sides of the polymer film, wherein
• a thickness of the layer containing graphene is 0.2 to 1 nm, and accounts for 0.02 to 1% of the entire thickness of the pellicle film.