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US 10,759,712 B2Granted
Powder for additive modeling, structure, semiconductor production device component, and semiconductor production device
AssigneeCanon Kabushiki Kaisha
InventorsNobuhiro Yasui, Hisato Yabuta, Kanako Oshima
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Abstract
A material powder for additive modeling including a nitride, and a eutectic oxide, the nitride having an average density lower than an average density of the eutectic oxide, is used to produce a structure using an additive modeling method.
Claims11
A material powder for additive modeling, comprising:
- a eutectic oxide;
- and
- a nitride having an average density lower than an average density of the eutectic oxide,
- wherein a weight ratio of eutectic oxide:nitride is from 10:1 to 3:10, and
- wherein the eutectic oxide contains aluminum oxide, and a compound of a rare earth oxide and aluminum oxide.
2 more elements
A method of producing a structure, the method comprising:
- preparing a powder containing a nitride particle and a particle containing a eutectic oxide containing aluminum oxide, and a compound of a rare earth oxide and aluminum oxide;
- constituting a powder layer including the powder;
- and
- irradiating the powder layer with an energy beam according to shape data of a three-dimensional model,
- the powder layer being irradiated with the energy beam so that a temperature of an irradiation portion of the energy beam is less than or equal to a decomposition temperature of the nitride particle, wherein the nitride particle has an average density lower than an average density of the eutectic oxide particle and the weight ratio of the eutectic oxide particle:nitride particle is from 10:1 to 3:10.
2 more elements
Dependencies are inferred from the claim text.