Method and apparatus for gas abatement

A plasma source, comprising:

• a dielectric tube;
• a coil antenna surrounding the dielectric tube, wherein the coil antenna comprises a plurality of turns having a first group of turns, a second group of turns, and a third group of turns;
• a first terminal coupled to a first end of the coil antenna and configured to couple to a power source;
• a second terminal coupled a second end of the coil antenna and configured to couple to the power source or ground;
• a third terminal coupled to a first turn of the second group of turns of the coil antenna, the third terminal disposed between the first and second terminals;
• a fourth terminal coupled to a second turn of the second group of turns of the coil antenna, the fourth terminal disposed between the second and third terminals;
• and
• a first electrically conductive connector connected to the third and fourth terminals, the first electrically conductive connector electrically shorting the first and second turns of the second group of turns, wherein the first electrically conductive connector is disposed between the first terminal and the second terminal and configured to form a buffer field between the first and second turns of the second group of turns separating a first plasma from a second plasma when power is applied to the coil antennae.