Thermally removable fill materials for anti-stiction applications
AssigneeHoneywell International Inc.
InventorsDesaraju Varaprasad, Songyuan Xie
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AssigneeHoneywell International Inc.
InventorsDesaraju Varaprasad, Songyuan Xie
Estimating the term…
A method for preventing the collapse of patterned, high aspect ratio features formed in semiconductor substrates upon removal of wash solutions of the type used to clean etch residues from the spaces between the features. In the present method, the spaces are at least partially filled with a displacement solution, such as via spin coating, to substantially displace the wash solution. The displacement solution includes at least one solvent and at least one fill material which is a polyalkene carbonate (PAC) and/or a saccharide. The solvent is then volatized to deposit the fill material in substantially solid form within the spaces. The fill material may be removed by thermal degradation via heat treatment, wherein the need for removal of the fill material by plasma ashing is obviated in order to prevent or mitigate silicon loss.
A method for preventing collapse of semiconductor substrate features, comprising the steps of:
A method for preventing collapse of semiconductor substrate features, comprising the steps of:
Dependencies are inferred from the claim text.