Multi-cathode EUV and soft x-ray source
AssigneeStellarray, Inc.
InventorsMark F Eaton, Robert J. Hollingsworth
Life of this patent
Estimating the term…
Abstract
An efficient source of EUV or SXR flux uses multiple e-beams from multiple cathodes to impact a wide anode target with a flux-generating surface to generate flux over a wide area. The conversion efficiency of e-beam power to flux power may be improved by the direction of the e-beams towards the anode target at shallow or grazing incidence angles or the use of mirrored anode surfaces which reflect EUV or SXR. The source is enclosed in a vacuum chamber and performs work such as the penetration of photoresist on a semiconductor wafer in vacuum.
Claims16
A source of Extreme Ultraviolet (EUV) or Soft X-ray (SXR) light flux comprising:
- at least one flat anode substrate with a surface of material emitting EUV or SXR flux in all directions off said surface upon impact by high energy electrons;
- said surface of said anode substrate facing a vacuum space across which is disposed a target to receive EUV or SXR flux emitted from said flat anode substrate;
- at least one cathode disposed to emit at least at least one electron beam to at least one flat anode substrate at a grazing angle to the plane of said EUV or SXR flux-emitting surface of said at least one flat anode substrate, the electrons traveling in said surface at said grazing angle before scattering;
- the emitted EUV or SXR flux traveling across said vacuum to impact said target.
A source of EUV or SXR light flux comprising:
- an anode substrate covered with a layer of porous or particulate material emitting EUV or SXR flux upon impact by high energy electrons, with the space between the pores or particulates occupied by vacuum;
- said anode substrate facing a vacuum space across which is disposed a target to receive EUV or SXR flux emitted from said anode substrate;
- at least one cathode disposed between said anode and said flux target to emit at least one electron beam to said anode substrate at a grazing angle to the pore walls or particle surfaces of said EUV or SXR flux-emitting layer;
- the emitted EUV or SXR flux thereupon traveling across said vacuum space to impact said target.
Dependencies are inferred from the claim text.