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US 10,744,349 B2Granted
Nail polish formulation
OwnerChristina Flintinventor
Life of this patent
Estimating the term…
Abstract
A formulation for a nail polish composition which is curable with UV light is provided. The composition can be applied in a single coating and does not include solvents such as tolualene, dibutyl phthalate, or formaldehyde. The coating once cured provides multi-coating results using only a single coating and can be covered with an optional gloss or other decorative top coating.
Claims3
A nail polish composition, comprising:
- a first mixture component which is substantially 45% by weight of the total composition, consisting of one or more oligomers, from a group of oligomers consisting of:
- Di-HEMA Trimethylhexyl Dicarbamate, and, Methacrylic Acid2-[[[[(5-Isocyanato-1,3,3-Trimethylcyclohexyl) Methyl]Amino]Carbonyl]Oxy]Ethyl Ester;
- a second mixture component, which is substantially 25.7% by weight of the total composition, consisting of one or more monomers, from a group of monomers consisting of:
- 2 Hydroxypropyl Methacrylate, 2 Hydroxy Ethyl Methacrylate, and Pyromellitic glycerol dimethacrylate;
- a third mixture component, which is substantially 19% by weight of the total composition, consisting of one or more cure accelerators, from a group of cure accelerators, consisting of:
- 2,4,6-Trimethyl-Benzoyl-Diphenyl phosphine oxide, 1-Hydroxy Cyclohexexyl Phenyl Keytone, and 2 Hydroxy-2-methylpropiophenone;
- a fourth mixture component, which is substantially 5.5% by weight of the total composition, consisting of one or more adhesion enhancers, from a group of adhesion enhancers, consisting of:
- Silicone acrylate polyether, and Triethylene Glycol Dimethacrylate;
- a fifth mixture component, which is substantially 1.8% by weight of the total composition, consisting of one or more fluid spread enhancers, from a group of spread enhancers, consisting of:
- Alkyl Quaternary Ammonium Clay, and Treated Silica;
- an antioxidant comprising Butylated Hydroxy Toluene at a concentration of substantially 1% by weight of the total composition;
- and
- a resin comprising Cellulose Acetate Butyrate, at a concentration of substantially 2% by weight.
10 more elements
A nail polish composition, comprising:
- oligomers by weight, of the composition, comprising:
- Di_HEMA Trimethylhexyl Dicarbamate 30%;
- METHACRYLIC ACID2-[[[[(5-ISOCYANATO-1,3,3-TRIMETHYLCYCLOHEXYL) METHYL]AMINO]CARBONYL]OXY]ETHYL ESTER 15%;
- monomers by weight of the total composition, comprising:
- Hydroxypropyl Methacrylate 15%;
- 2 Hydroxy Ethyl Methacrylate 10.2%;
- Pyromellitic glycerol dimethacrylate 0.5%;
- cure Accelerators by weight, of the composition, comprising:
- TrimethylBenzoil Diphenyl Phosphine Oxide 5%;
- Hydroxy Cyclohexexyl Phenyl Keytone 4%;
- 2 Hydroxy-2-methylpropiophenone 10%;
- adhesion enhancers by weight of the total composition, comprising:
- Silicone polyether acrylate 0.5%
- Triethylene Glycol Dimethacrylate 5%
- fluid spread enhancers by weight of the total compositon comprising:
- Alkyl Quaternary Ammonium Clay 0.8%;
- Treated Silica 1%;
- Butylated Hydroxy Toluene 1% by weight of the total compositon;
- and
- cellulose acetate butyrate 2% by weight of the total compositon.
17 more elements
Dependencies are inferred from the claim text.