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US 10,739,679 B2Granted
Ruggedized solder mask material
AssigneeInternational Business Machines Corporation
InventorsMatthew Kelly, Mark Jeanson, Joseph Kuczynski
Life of this patent
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Abstract
Disclosed herein are solder mask formulations that include a liquid photo imagable solution and a solution of functionalized diamondoids. Also disclosed are semiconductor fabrication methods that include applying a described solder mask formulation to a semiconductor device.
Claims20
A solder mask formulation, comprising:
- a liquid photo imagable solution;
- and
- a solution of functionalized diamondoids, wherein a size of a diamondoid moiety of a functionalized diamondoid of the solution of functionalized diamondoids is between approximately 1 nanometer (nm) and approximately 50 microns.
A solder mask formulation comprising:
- a photoinitiator representing approximately 0% to approximately 30% by weight of the solder mask formulation;
- a functionalized diamondoid solution representing approximately 10% to approximately 50% by weight of the solder mask formulation, wherein a size of a diamondoid moiety of a functionalized diamondoid of the functionalized diamondoid solution is between approximately 1 nanometer (nm) and approximately 50 microns;
- an ether representing approximately 10% to approximately 30% by weight of the solder mask formulation;
- an aromatic representing approximately 0% to approximately 10% by weight of the solder mask formulation;
- a sulfate representing approximately 10% to approximately 30% by weight of the solder mask formulation;
- an acetate representing approximately 0% to approximately 10% by weight of the solder mask formulation;
- and
- one or more acrylates each representing approximately 1% to approximately 30% by weight of the solder mask formulation.
5 more elements
A semiconductor fabrication method comprising:
- applying a solder mask formulation to a semiconductor device, the solder mask formulation comprising:
- a liquid photo imagable solution;
- and
- a solution of functionalized diamondoid, wherein a size of a diamondoid moiety of a functionalized diamondoid of the functionalized diamondoid solution is between approximately 1 nanometer (nm) and approximately 50 microns.
1 more element
Dependencies are inferred from the claim text.