X-ray diffraction apparatus
AssigneeRigaku Corporation
InventorsTakeshi Osakabe, Toru Mitsunaga
Life of this patent
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Abstract
An X-ray diffraction apparatus includes: an X-ray source (110); a first incident path letting the generated X-ray beam pass therethrough; a second incident path letting the generated X-ray beam be reflected by a multilayer film mirror and letting the reflected X-ray beam pass therethrough in parallel with the X-ray beam having passed through the first incident path. A movement mechanism is provided moving the X-ray source (110) between the first incident path and the second incident path while preserving respective relative positions thereof. An incident slit (160) allows an X-ray beam to be incident on a sample S pass therethrough; and a sample support stage (165) supports the sample S at a position fixed relative to the incident slit (160).
Claims5
An X-ray diffraction apparatus comprising:
- an X-ray source configured to generate an X-ray beam;
- a first incident path configured to let the X-ray beam pass therethrough with a predetermined divergence angle;
- a second incident path configured to let the X-ray beam be reflected by a multilayer film mirror and let the X-ray beam after reflection to pass therethrough in parallel with the X-ray beam having passed through the first incident path;
- a movement mechanism configured to move the X-ray source, the first incident path, and the second incident path in a predetermined direction while preserving respective relative positions thereof;
- an incident slit configured to let the X-ray beam to be incident on a sample pass therethrough;
- and
- a sample support stage configured to support the sample at a position fixed relative to the incident slit,
- wherein the movement mechanism switches the X-ray beam to be passed through the incident slit between the X-ray beam having passed through the first incident path or alternatively the second incident path.
Dependencies are inferred from the claim text.