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US 10,727,367 B2Granted
Cost-efficient high power PECVD deposition for solar cells
AssigneeInternational Business Machines Corporation
InventorsTze-Chiang Chen, Augustin J. Hong, Jeehwan Kim, Devendra K. Sadana
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Abstract
A method for forming a photovoltaic device includes providing a substrate. A layer is deposited to form one or more layers of a photovoltaic stack on the substrate. The depositing of the amorphous layer includes performing a high power flash deposition for depositing a first portion of the layer. A low power deposition is performed for depositing a second portion of the layer.
Claims9
A plasma enhanced chemical vapor deposition (PECVD) system, comprising:
- a vacuum chamber having a platform configured to receive a substrate;
- and
- a common electrode disposed in the vacuum chamber and positioned over the platform, the common electrode having a first end connected to a first power generator configured to perform a high power PECVD flash deposition for depositing a first portion of a layer on the substrate, and a second end connected to a second power generator configured to perform a low power PECVD deposition for depositing a second portion of the layer on the substrate, the first power generator and the second power generator sharing usage of the common electrode in the vacuum chamber, and being controllable to form a p-type layer using high power PECVD and using low power PECVD for other layers within the vacuum chamber.
Dependencies are inferred from the claim text.