Compound, resin, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Satoshi Yamamoto, Koji Ichikawa
Life of this patent
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Abstract
A compound represented by the formula (I). wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom; R2 represents a C1 to C12 fluorinated saturated hydrocarbon group; W1 represents a C5 to C18 divalent alicyclic hydrocarbon group; A1 and A2 independently represents a single bond or *—A3—X1—(A4—X2)a—; A3 and A4 independently represents a C1 to C6 alkanediyl group; X1 and X2 independently represents —O—, —CO—O—or —O—CO—; a represents 0 or 1; and * represents a bond to an oxygen atom.
Claims3
A resin consisting of a structural unit derived from a compound represented by formula (I)
- wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom;
- R2 represents -(CH2)n-Rf or -CH(Rfa)(Rfb), wherein n represents an integer of 1 to 6, and Rf, Rfa, and Rfb each independently represent a C1 to C6 perfuloroalkyl group;
- W1 represents a cyclopentanediyl group, a cyclohexanediyl group, an adamantanediyl group or a norbomanediyl group;
- A1 and A2 each independently represent a single bond or *—A3—X1—(A4—X2)a—;
- A3 and A4 each independently represent a C1 to C6 alkanediyl;
- X1 and X2 each independently represents —O—, —CO—O— or —O—CO—;
- a represents 0 or 1;
- and
- * represents a binding site to an oxygen atom;
- or consisting of the structural unit derived from a compound represented by formula (I) and at least one selected from the group consisting of a structural unit represented by the formula (a4-0), (a4-1) or (a4-4),
- wherein R5 represents a hydrogen atom or a methyl group, L5 represent a single bond or a C1 to C4 saturated aliphatic hydrocarbon group, L3 represents a C1 to C8 perfluoroalkanediyl group or a C5 to C12 perfluorocycloalkanediyl group, R6 represents a hydrogon atom or a fluorine atom,
- Ra41 represents a hydrogen atom or a methyl group,
- Ra42 represents an optionally substituted C1 to C20 hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and
- Aa41 represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-g1),
- wherein s represents 0 or 1, Aa42 and Aa44 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group, Aa43 represents a single bond or an optionally substituted C1 to C5 aliphatic hydrocarbon group, and Xa41 and Xa42 independently represent —O—, —CO—, —CO—O— or —O—CO—, provided that the total carbon number contained in the group of Aa42, Aa43, Aa44, Xa41 and Xa42 is 6 or less, and at least one of Aa41 and Ra42 has a halogen atom as a substituent, and * and ** represent a binding site, and * represents a binding site to —O—CO—Ra42,
- Rf21 represents a hydrogen atom or a methyl group,
- Af21 represents —(CH2)j1—, —(CH2)j2—O—(CH2)j3— or —(CH2j4—CO—O—(CH2)j5—, j1 to j5 independently represents an integer of 1 to 6, and Rf22 represents a C1 to C10 hydrocarbon group having a fluorine atom, and a structural unit represented by the formula (a5-1);
- wherein R51 represents a hydrogen atom or a methyl group,
- R52 represents a C3 to C18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C1 to C8 aliphatic hydrocarbon group or a hydroxy group, provided that a hydrogen atom contained in the carbon atom bonded to L51 is not replaced by the C1 to C8 aliphatic hydrocarbon group, and
- L51 represents a single bond or a C1 to C18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group.
Dependencies are inferred from the claim text.