Micromechanical structure and method for manufacturing the same
AssigneeInfineon Technologies AG
InventorsTobias Frischmuth, Guenter Denifl, Thomas Grille, Ursula Hedenig, Markus Kahn, Daniel Maurer, Ulrich Schmid, Michael Schneider
Life of this patent
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Abstract
A micromechanical structure in accordance with various embodiments may include: a substrate; and a functional structure arranged at the substrate; wherein the functional structure includes a functional region which is deflectable with respect to the substrate responsive to a force acting on the functional region; and wherein at least a section of the functional region has an elastic modulus in the range from about 5 GPa to about 70 GPa.
Claims21
A micromechanical structure, comprising:
- a substrate;
- and
- a functional structure arranged at the substrate;
- wherein the functional structure comprises a first functional region, adjacent to a first portion of the substrate, the first functional region being deflectable with respect to the substrate responsive to a force acting on the functional structure;
- and a second functional region, wherein the first functional region is between the first portion of the substrate and the second functional region;
- wherein the first functional region comprises a base material;
- wherein the second functional region has at least one of a module of elasticity or a hardness within a range of 5 GPa to 70 GPa;
- wherein in at least one section of the first functional region the base material is doped with impurity atoms, so that at least one of a module of elasticity or a hardness in the at least one section is 75% or less of the module of elasticity or the hardness in the second functional region of the functional structure that is not doped with impurity atoms or is doped less than the at least one section;
- wherein the impurity atoms comprise at least one of phosphorus, carbon, nitrogen, oxygen, boron, fluorine, gallium, germanium, and arsenic;
- and further comprising at least one backplate, the backplate contacting the substrate and separated by an air-gap from the functional structure;
- wherein the functional structure is actuated in response to an electrical signal transmitted to the backplate.
A sound transducer comprising a micromechanical structure, the micromechanical structure comprising:
- a substrate;
- and
- a functional structure arranged at the substrate;
- wherein the functional structure comprises a first functional region, adjacent to a first portion of the substrate, the first functional region being deflectable with respect to the substrate responsive to a force acting on the functional structure;
- and a second functional region, wherein the first functional region is between the first portion of the substrate and the second functional region;
- wherein the first functional region comprises a base material;
- wherein the second functional region has at least one of a module of elasticity or a hardness within a range of 5 GPa to 70 GPa;
- wherein in at least one section of the first functional region the base material is doped with impurity atoms, so that at least one of a module of elasticity or a hardness in the at least one section is 75% or less of the module of elasticity or the hardness in the second functional region of the functional structure that is not doped with impurity atoms or is doped less than the at least one section;
- wherein the impurity atoms comprise at least one of phosphorus, carbon, nitrogen, oxygen, boron, fluorine, gallium, germanium, and arsenic;
- and
- wherein the sound transducer is configured to transduce sound.
A sensor comprising a micromechanical structure, the micromechanical structure comprising:
- a substrate;
- and
- a functional structure arranged at the substrate;
- wherein the functional structure comprises a first functional region, adjacent to a first portion of the substrate, the first functional region being deflectable with respect to the substrate responsive to a force acting on the functional structure;
- and a second functional region, wherein the first functional region is between the first portion of the substrate and the second functional region;
- wherein the first functional region comprises base material;
- wherein the second functional region has at least one of a module of elasticity or a hardness within a range of 5 GPa to 70 GPa;
- wherein in at least one section of the first functional region the base material is doped with impurity atoms, so that at least one of a module of elasticity or a hardness in the at least one section is 75% or less of the module of elasticity or the hardness in the second of the functional region of the functional structure that is not doped with impurity atoms or is doped less than the at least one section;
- wherein the impurity atoms comprise at least one of phosphorus, carbon, nitrogen, oxygen, boron, fluorine, gallium, germanium, and arsenic;
- wherein the sensor is configured to provide an electrical signal in response to the actuation of the functional region;
- further comprising at least one backplate, the backplate contacting the substrate and separated by an air-gap from the functional structure;
- and
- wherein the functional structure is actuated in response to an electrical signal transmitted to the backplate.
Dependencies are inferred from the claim text.