US 10,707,484 B2 · Structurally controlled deposition of silicon onto nanowires

Abstract

Provided herein are nanostructures for lithium ion battery electrodes and methods of fabrication. In some embodiments, a nanostructure template coated with a silicon coating is provided. The silicon coating may include a non-conformal, more porous layer and a conformal, denser layer on the non-conformal, more porous layer. In some embodiments, two different deposition processes, e.g., a PECVD layer to deposit the non-conformal layer and a thermal CVD process to deposit the conformal layer, are used. Anodes including the nanostructures have longer cycle lifetimes than anodes made using either a PECVD or thermal CVD method alone.

Claims30

Dependent claims

An anode for a lithium battery, comprising:

a) a substrate;
b) a nanowire template rooted to the substrate;
c) a first amorphous silicon layer substantially coating the nanowire template, the first amorphous silicon layer having a first density;
and
d) a second amorphous silicon layer over the first amorphous silicon layer and any exposed nanowire template, the second amorphous silicon layer having a density higher than the density of the first amorphous silicon layer.

2 more elements

Dependencies are inferred from the claim text.

Facts

Application

15/887,809Filed 2 Feb 2018 · continuation

Priority

12 May 2014

Published

US 2019/0088939 A121 Mar 2019

Granted

7 Jul 2020

Term ends

Not estimatedThe source records don’t support an estimate.

Classification11 codes

H01M 4/386
Of elements or alloys: silicon or alloys based on silicon
H01M 4/0428
Involving vapour deposition: chemical vapour deposition
H01M 4/134
Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof: electrodes based on…
H01M 4/1395
Processes of manufacture: of electrodes based on metals, Si or alloys

Family

Application61/992,121Us provisional application · filed 12 May 2014

Application14/710,103Parent of this continuation · filed 12 May 2015

US 2019/0088939 A1Pre-grant publication · published 21 Mar 2019

US 9,923,201 B2Parent of this continuation

US 2015/0325852 A1Published application

US 10,707,484 B2This patent

From the US filing history. Foreign family members aren’t listed.

Structurally controlled deposition of silicon onto nanowires

Life of this patent

Structurally controlled deposition of silicon onto nanowires

Life of this patent

Abstract

Claims30