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US 10,707,419 B2Granted
Light source and a manufacturing method therewith
AssigneeInt Tech Co., Ltd.
InventorChien-Yu Chen
Life of this patent
Estimating the term…
Abstract
A method of forming a device includes emitting a coherent light beam and providing a mask including a region transparent to the light beam. The method further includes projecting the light beam on a photosensitive layer through the transparent region of the mask. The method further includes forming a recess in the photosensitive layer, wherein the recess corresponds to a position of the transparent region of the mask. The method further includes filling an organic light emitting material in the recess.
Claims19
An apparatus for photolithography, comprising:
- a light source for emitting a coherent light beam, wherein the coherent light beam is configured to be transparent to a region of a mask and projecting on a predetermined photosensitive layer for directly carving out the projected portion of the photosensitive layer;
- and
- a stage for holding a substrate having the photosensitive layer;
- and
- a detector for emitting an acoustic wave or optical beam toward the mask.
2 more elements
An apparatus for annealing, comprising:
- a light source for emitting a coherent light beam, wherein the coherent light beam is configured to provide energy to a film on a substrate;
- and
- a stage for holding a substrate having the photosensitive layer;
- and
- a detector for emitting an acoustic wave or optical beam toward the mask.
2 more elements
Dependencies are inferred from the claim text.