Array substrate, manufacturing method therefor and display device

An array substrate, comprising:

• a base substrate;
• a light-shielding patter layer, a buffer layer, an active layer, a gate insulating layer, and a gate electrode, which are away from the base substrate in sequence;
• a first interlayer dielectric (ILD) disposed above the active layer, the first ILD being made from opaque insulating a-Si material and provided with through holes through which a source contact region and a drain contact region of the active layer are exposed;
• a source electrode and a drain electrode on the first ILD, which are respectively connected with the source contact region and the drain contact region via the through holes;
• and
• a plurality of pixel regions, wherein the first ILD further comprises a hollowed-out part disposed in each of the pixel regions.

A display device, comprising an array substrate, wherein the array substrate comprises:

• a base substrate;
• a light-shielding pattern layer, a buffer layer, an active layer, a gate insulating layer, and a gate electrode, which are away from the base substrate in sequence;
• a first interlayer dielectric (ILD) disposed above the active layer, the first ILD being made from opaque insulating a-Si material and provided with through holes through which a source contact region and a drain contact region of the active layer are exposed;
• a source electrode and a drain electrode on the first ILD, which are respectively connected with the source contact region and the drain contact region via the through holes;
• and
• a plurality of pixel regions, wherein the first ILD further comprises a hollowed-out part disposed in each of the pixel regions.