High-frequency device and manufacturing method thereof
AssigneeInnolux Corporation
InventorsMing-Yen Weng, Ker-Yih Kao, Chia-Chi Ho, Tsutomu Shinozaki, Cheng-Chi Wang, I-Yin Li
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Abstract
A high-frequency device manufacturing method is provided. The method includes providing a substrate; forming a conductive material on the substrate; standing the substrate and the conductive material for a first time duration; forming a conductive layer by sequentially repeating the steps of forming the conductive material and standing at least once; and patterning the conductive layer. The thickness of the conductive layer is in a range from 0.9 μm to 10 μm. A high-frequency device is also provided.
Claims4
A method for manufacturing a high-frequency device, comprising:
- providing a substrate;
- forming a conductive material on the substrate;
- standing the substrate and the conductive material for a first time duration;
- forming a conductive layer by sequentially repeating the step of forming the conductive material and the step of standing at least once, wherein a thickness of the conductive layer is in a range from 0.9 μm to 10 μm;
- and
- patterning the conductive layer, wherein the conductive layer comprises copper;
- wherein the first time duration is in a range from 0.5 minutes to 30 minute.
A method for manufacturing a high-frequency device, comprising:
- providing a substrate;
- forming a conductive material on the substrate;
- standing the substrate and the conductive material for a first time duration;
- forming a conductive layer by sequentially repeating the step of forming the conductive material and the step of standing at least once, wherein a thickness of the conductive layer is in a range from 0.9 μm to 10 μm;
- and
- patterning the conductive layer, wherein the conductive layer comprises copper;
- wherein a temperature of the substrate in the step of patterning the conductive layer is higher than a temperature of the substrate in the step of forming the conductive layer.
Dependencies are inferred from the claim text.