Substrate cleaning apparatus and substrate processing apparatus

A substrate cleaning apparatus for cleaning a substrate, comprising:

• a roll holder configured to support an elongated roll cleaning member and rotate the roll cleaning member;
• an actuator configured to press the roll cleaning member against a surface of the substrate so that the roll cleaning member applies a predetermined load to the substrate at the time of cleaning the substrate, and to separate the roll cleaning member from the surface of the substrate;
• a roll holder supporting unit configured to move together with the roll holder by actuation of the actuator while supporting the roll holder, in the direction of pressing the roll cleaning member against the surface of the substrate or in the direction of separating the roll cleaning member from the surface of the substrate;
• a load cell provided between the roll holder supporting unit and the roll holder and configured to measure the load applied to the substrate by the roll cleaning member, by measuring the load applied in the direction of pressing the roll cleaning member against the substrate;
• and
• a controller configured to perform feedback control of the load by controlling an output of the actuator based on a measured value of the load cell,
• wherein the controller is configured to set, for each preset load, timing to start the feedback control of the load applied to the substrate, and
• wherein the load cell is provided at a substantially central area along a longitudinal direction of the roll holder and is coupled to the roll holder supporting unit.