Substrate processing apparatus

A substrate processing apparatus for processing a substrate, comprising:

• a substrate supporting part for supporting a substrate horizontally from below;
• an upper rotating member disposed above said substrate supporting part;
• a plurality of first engagers and a plurality of second engagers respectively disposed on said upper rotating member and said substrate supporting part and configured to be engaged together by relative vertical movement therebetween, to regulate a position of said upper rotating member relative to said substrate supporting part in a circumferential direction about a central axis oriented in a vertical direction;
• a substrate retaining part fixed to said upper rotating member, for retaining said substrate held by said substrate supporting part from above;
• a substrate rotator rotating said substrate together with said substrate supporting part, said substrate retaining part, and said upper rotating member;
• a processing liquid supply part for supplying a processing liquid onto said substrate,
• a chamber having a chamber body and a chamber cover and forming an internal space which is sealed by closing an upper opening of said chamber body by said chamber cover;
• and
• a chamber cover elevator moving said chamber cover in said vertical direction relative to said chamber body to open and close said chamber,
• wherein said upper rotating member has a plate-like shape perpendicular to said central axis,
• a lower surface of said upper rotating member is opposed to an upper surface of said substrate,
• said substrate supporting part is disposed in said chamber,
• said substrate supporting part comprises a plurality of first contact parts which come into contact with an outer edge of said substrate at a plurality of first contact positions, respectively,
• said substrate retaining part comprises a plurality of second contact parts which come into contact with said outer edge of said substrate at a plurality of second contact positions different from said plurality of first contact positions, respectively, in said circumferential direction,
• said chamber cover is movable relatively in said vertical direction, together with said upper rotating member supported by said chamber cover, and
• in a state where said substrate retaining part is in contact with said substrate, the holding of said upper rotating member by said chamber cover is released, and said upper rotating member is not in contact with said chamber cover.