Substrate processing apparatus

A substrate processing apparatus for processing a substrate, comprising:

• a chamber having a chamber body and a chamber cover and forming an internal space which is sealed by closing an upper opening of said chamber body by said chamber cover;
• a chamber cover elevator moving said chamber cover in a vertical direction relative to said chamber body;
• a substrate holder disposed in said chamber, for holding a substrate horizontally;
• a substrate rotator rotating said substrate together with said substrate holder about a central axis oriented in said vertical direction;
• a processing liquid supply part for supplying a processing liquid onto said substrate;
• a cup part positioned on an outer side in a radial direction relative to an annular opening formed around said substrate by causing said chamber cover to be apart from said chamber body, along the entire circumference thereof, for receiving said processing liquid splattering from said substrate being rotated;
• and
• a cup elevator moving said cup part in said vertical direction between a first position on said outer side in said radial direction relative to said annular opening and a second position lower than said first position,
• wherein said cup part comprises:
• a sidewall portion having a substantially cylindrical shape and being opposed to said annular opening in said radial direction at said first position;
• a first seal portion on which a first seal is formed between said first seal portion and said chamber cover along the entire circumference of said chamber cover at said first position;
• and
• a second seal portion on which a second seal is formed between said second seal portion and said chamber body along the entire circumference of said chamber body at said first position, and
• a sealed space is formed by said chamber cover and said chamber body in a state where said annular opening is formed, and said cup part positioned at said first position.