Orthogonal patterning method
AssigneeGwangju Institute of Science and Technology
InventorsMyung Han Yoon, Su Jin Sung
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Abstract
The present invention relates to a method for forming a layer, to be patterned, of an element by using a fluorinated material, which has orthogonality, and a solvent, the method comprising: a first step of printing with the fluorinated material so as to form, on a surface of a substrate, a mask template provided with an exposure part and a non-exposure part; a second step of coating the exposure part with a material to be patterned; a the third step of lifting-off the non-exposure part with the fluorinated solvent so as to form the layer to be patterned in the exposure part.
Claims16
An orthogonal patterning method of forming a pattern target layer of a device using a fluorinated material and solvent with orthogonality, the method comprising:
- a first step of printing the fluorinated material to form a mask template including an exposed portion and a non-exposed portion on a surface of a substrate the surface of the substrate further comprises a functional layer;
- and the first step is performed on the functional layer;
- a second step of coating the exposed portion with a pattern target material and further coating a surface of the non-exposed portion with the pattern target material;
- and
- a third step of lifting-off the non-exposed portion using the fluorinated solvent to form the pattern target layer on the exposed portion,
- wherein the method further comprises, prior to the first step, a preprocessing step of preprocessing the surface of the substrate in a printable form with the fluorinated material, and
- wherein the fluorinated material consists of a perfluorinated material and the fluorinated solvent consists of a perfluorinated solvent.
Dependencies are inferred from the claim text.