Substrate processing apparatus and substrate processing system including the same

A substrate processing apparatus, comprising:

• a chamber providing a space to process a substrate, the chamber including an upper chamber and a lower chamber engageably clamped to each other, the upper chamber and the lower chamber configured to switch between a closed state where the chamber is closed and an open state where the chamber is open;
• a first substrate support within the chamber, the first substrate support configured to support the substrate when the chamber is in an open state to load the substrate into chamber;
• a second substrate support within the chamber, the second substrate support configured to support the substrate while the chamber is in the closed state when the substrate is processed in the chamber at a height greater than a height in which the first substrate support supports the substrate when the chamber is in the open state;
• a first supply port configured to supply a supercritical fluid to a first space under the substrate in the chamber;
• a second supply port configured to supply the supercritical fluid to a second space above the substrate in the chamber;
• and
• an exhaust port configured to exhaust the supercritical fluid from the chamber.

A substrate processing apparatus comprising:

• a chamber;
• a first support system configured to support a substrate from a periphery of the substrate, if the chamber is in an open state;
• and
• a second support system configured to support the substrate from a middle portion thereof while the substrate is not supported by the first support system, if the chamber is in a closed state.