Lithographic apparatus and device manufacturing method

A substrate support for an immersion lithographic apparatus configured to project a patterned beam, using a projection system, onto a substrate via liquid supplied to a space between the projection system and the substrate, the substrate support comprising:

• a body configured to support the substrate on a support plane defined by a plurality of projections, the body configured to be removably supported on a movable substrate stage structure in the immersion lithographic apparatus;
• and
• an extractor arrangement located at least partly in the body with at least part of extraction piping of the extractor arrangement located at or below the support plane, the extractor arrangement having an opening in or on the body, the opening sized so as to remove fluid and at least part of the extractor piping having a hydrophobic wall inside the body.

A substrate support for an immersion lithographic apparatus configured to project a patterned beam, using a projection system, onto a substrate via liquid supplied to a space between the projection system and the substrate, the substrate support comprising:

• a body configured to support the substrate and configured to be removably supported on a movable substrate stage structure in the immersion lithographic apparatus;
• and
• extraction piping located at least partly in the body, at least part of the extraction piping in or on the body is in fluid communication with the space and configured to remove liquid via a capillary action.