Lithographic apparatus and device manufacturing method

A substrate holder for a lithographic apparatus, the substrate holder comprising:

• a support surface configured to hold a resist-coated substrate in the lithographic apparatus;
• an outlet located below a bottom surface of the substrate when held on the support surface, the outlet configured to drain fluid from above the substrate holder;
• and
• a trench defined in a surface of the substrate holder, the trench located outward, relative to the support surface, of the substrate when supported on the support surface gap, the trench surrounding and spaced apart in the horizontal from, an outer periphery of the substrate when held on the support surface.

A substrate holder for a lithographic apparatus, the substrate holder comprising:

• a support surface configured to receive a resist-coated substrate in the lithographic apparatus;
• a trench at an upper side of the substrate holder, the trench located horizontally outward of the support surface and surrounding the support surface, the trench open to a same ambient environment as the support surface is open to;
• and
• a removable member located at the upper side of the substrate holder and located horizontally outward of an outer periphery of the substrate when supported on the substrate holder.