Method of measuring a parameter of interest, inspection apparatus, lithographic system and device manufacturing method

A non-transitory computer program product comprising machine readable instructions therein, the instructions, upon execution by a programmable processing device, configured to cause the programmable processing device to at least:

• obtain measurements of a structure formed by a process on a substrate with measurement radiation comprising a first illumination acquisition setting to obtain a first measurement value for the structure corresponding to measurement of the structure with the first illumination acquisition setting, wherein the illumination acquisition setting determines one or more selected from:
• a wavelength, a polarization or an incident angle of the measurement radiation;
• and
• estimate, by application of a correction model to the first measurement value, at least a second measurement value for the structure corresponding to measurement of the structure with a second illumination acquisition setting different from the first illumination acquisition setting.