Organic processing liquid for patterning chemical amplification resist film, container for organic processing liquid for patterning chemical amplification resist film, and pattern forming method, method of manufacturing electronic device, and electronic device using the same

A pattern forming method comprising:

• (A) forming a film from a chemical amplification resist composition by applying the chemical amplification resist composition on a substrate;
• (B) pattern exposing the film;
• and
• (C) developing the exposed film using an organic developer, the organic developer being butyl acetate,
• wherein the organic developer contains 1 ppm or less of alkylolefin having a carbon number of 22 or less, and 5 ppm or less of metal element concentration of each of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni and Zn;
• the organic developer is stored in a container before developing, the container having an inner wall contacting with the organic developer, the inner wall being made from a perfluoro resin;
• and
• the organic developer is filtered through a polytetrafluoroethylene filter before the developing step (C).