Imprint apparatus and method of manufacturing article

An imprint apparatus which forms a pattern in an imprint material on a substrate having a plurality of shot regions by using a mold having a pattern region where a pattern to be transferred to each shot region of the plurality of shot regions is formed, the imprint apparatus comprising:

• a substrate holder configured to hold the substrate;
• a mold holder configured to hold the mold;
• a deformer configured to deform at least one of the mold and the substrate into a convex shape protruding toward the other by adjusting a pressure of a space respectively associated with the at least one of the mold and the substrate;
• a detector configured to detect a mark provided on the mold and a mark provided on the substrate;
• and
• processing circuitry configured to (i) determine a first position in a first shot region on the substrate, (ii) control at least one of the substrate holder and the mold holder so as to cause the mold and the imprint material to contact each other such that the mold initially contacts the imprint material at a first position on the mold and the imprint material initially contacts the mold at a first position on the imprint material, which corresponds to the first position in the first shot region on the substrate, in a state in which the at least one of the mold and the substrate is deformed by the deformer, and to cause a contact area between the mold and the imprint material to increase while a deformation amount of the at least one of the mold and the substrate is decreased by the deformer, (iii) cause the detector to detect the mark provided on the mold and the mark provided on the substrate, (iv) obtain a detection result according to the detector detecting the mark provided on the mold and the mark provided on the substrate, and (v) determine relative positions of the mark provided on the mold and the mark provided on the substrate based on the obtained detection result,
• wherein the processing circuitry is configured to control the at least one of the substrate holder and the mold holder so as to control a position of the mold relative to the substrate, a position of the substrate relative to the mold, or both the position of the mold relative to the substrate and the position of the substrate relative to the mold while the contact area between the mold and the imprint material is being increased and the deformation amount of the at least one of the mold and the substrate is being decreased by the deformer, and without relying upon the detection result of the detector, such that the first position on the mold at which the mold initially contacted the imprint material is maintained within an allowable range of the first position in the first shot region on the substrate corresponding to the first position on the imprint material at which the imprint material initially contacted the mold.