Mask bias approximation
AssigneeASML US, Inc.
InventorsSong Lan, Ke Zhao, Yang Cao, Jihui Huang
Life of this patent
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Abstract
Directly biasing a mask image is disclosed. A method includes generating a mask image for the mask, biasing the mask image to obtain a biased mask image, and simulating the biased mask image to obtain a wafer image to be compared to the design pattern. Biasing the mask image includes updating at least one pixel of the mask image using an interpolation of neighboring pixels of the at least one pixel, the interpolation being dependent on a predetermined value.
Claims20
A method of optimizing a mask used to produce a design pattern, the method comprising:
- generating a mask image for the mask;
- biasing the mask image to obtain a biased mask image by updating at least one pixel of the mask image using an interpolation of neighboring pixels of the at least one pixel, the interpolation being dependent on a predetermined value relating to a bias value;
- and
- simulating the biased mask image to obtain a wafer image to be compared to the design pattern.
An apparatus for optimizing a mask used to produce a design pattern, the apparatus comprising:
- a processor system;
- and
- a memory configured to store instructions executable by the processor system, the instructions, upon execution by the processor system, configured to cause the processor system to at least:
- generate a mask image for the mask;
- bias the mask image to obtain a biased mask image by updating at least one pixel of the mask image using an interpolation of neighboring pixels of the at least one pixel, the interpolation being dependent on a predetermined value relating to a bias value;
- and
- simulate the biased mask image to obtain a wafer image to be compared to the design pattern.
A non-transitory computer-readable storage medium, comprising instructions therein, which instructions, when executed by a processor system, are configured to cause the processor system to at least:
- generate a mask image for a mask to be used to produce a design pattern;
- bias the mask image to obtain a biased mask image by updating at least one pixel of the mask image using an interpolation of neighboring pixels of the at least one pixel, the interpolation being dependent on a predetermined value relating to a bias value;
- and
- simulate the biased mask image to obtain a wafer image to be compared to the design pattern.
Dependencies are inferred from the claim text.