Method for detecting surface impurities by X-ray fluorescence analysis

A method for detecting surface impurities on a surface of a component by X-ray fluorescence analysis using a hand spectroscope for application to the surface of the component, wherein the hand spectroscope comprises an X-ray source, a fluorescent radiation detector, an analyzer and a display, the method comprising:

• irradiating the surface of the component with X-rays using the X-ray source;
• detecting fluorescent radiation, which is emitted by the surface of the component as a result of irradiating with the X-rays, using the fluorescent radiation detector;
• measuring a radiation spectrum of the detected fluorescent radiation;
• generating an evaluation result by analyzing the measured radiation spectrum using the analyzer, the evaluation result comprising a quantitative measure of a surface impurity of the surface due to predetermined characteristic substances;
• and
• outputting the generated evaluation result on the display;
• wherein the hand spectroscope further comprises a radiation-permeable radiation window, a measurement chamber adjacent to the radiation window and defining a controlled volume, and a gas flush coupled to the measurement chamber;
• wherein the radiation-permeable radiation window has a geometric position such that the radiation-permeable radiation window is configured to provide a focusing distance between the X-ray source and the surface of the component;
• and
• wherein generating the evaluation result comprises comparing the measured radiation spectrum with one or more reference spectra of cleaned surfaces and/or of soiled surfaces.