X-ray device, X-ray irradiation method, and manufacturing method for structure
AssigneeNikon Corporation
InventorTakashi Watanabe
Life of this patent
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Abstract
Provided is an x-ray device capable of suppressing reduction in detection precision. The X-ray device irradiates x-rays on an object and detects X-rays that pass through the object. The X-ray device comprises: an X-ray source that emits X-rays; a stage that holds the object; a detection device that detects at least some of the x-rays that have been emitted from the X-ray source and have passed through the object; a chamber member that forms an internal space wherein the X-ray source, the stage, and the detection device are arranged; and a partitioning section that separates the internal space into a first space wherein the X-ray source is arranged and a second space wherein the detection device is arranged.
Claims18
A profile measuring apparatus configured to measure a profile of an object by irradiating the object with an X-ray and detecting a transmission X-ray transmitted through the object, comprising:
- an X-ray source configured to emit the X-ray including:
- a filament configured to generate electrons,
- a target configured to generate the X-ray by bombardment of electrons,
- an electron conduction member configured to conduct the electrons to the target,
- a housing accommodating at least a part of the electron conduction member, and
- a duct in which a temperature-controlled fluid is to flow so that heat of the housing is cooled by the temperature-controlled fluid flowing in the duct;
- a stage configured to retain the object;
- a detector configured to detect at least a part of the X-ray which is emitted from the X-ray source and has passed through the object;
- a chamber member defining an internal space in which the X-ray source, the stage, and the detector are placed;
- a partition configured to divide the internal space into a first space in which the X-ray source is placed and a second space in which the detector is placed;
- and
- a supply port through which a temperature-controlled gas that is different from the temperature-controlled fluid is supplied to a part of an outer surface of the housing or the target, the supply port being placed in the first space, and
- wherein the partition is configured to restrain the temperature-controlled gas from flowing to the second space in which the detector is placed.
A profile measuring method, performed by a profile measuring apparatus configured to measure a profile of an object by irradiating the object with an X-ray and detecting a transmission X-ray transmitted through the object, the method comprising:
- emitting the X-ray using an X-ray source including:
- a filament configured to generate electrons,
- a target configured to generate the X-ray by bombardment of electrons,
- an electron conduction member configured to conduct the electrons to the target,
- a housing accommodating at least a part of the electron conduction member, and
- a duct in which a temperature-controlled fluid is to flow so that heat of the housing is cooled by the temperature-controlled fluid flowing in the duct;
- retaining the object using a stage;
- detecting at least a part of the X-ray which is emitted from the X-ray source and has passed through the object;
- defining, using a chamber member, an internal space in which the X-ray source, the stage, and the detector are placed;
- dividing, using a partition, the internal space into a first space in which the X-ray source is placed and a second space in which the detector is placed;
- and
- supplying a temperature-controlled gas that is different from the temperature-controlled fluid is supplied from a supply port to a part of an outer surface of the housing or the target, the supply port being placed in the first space, and
- wherein the partition is configured to restrain the temperature-controlled gas from flowing to the second space in which the detector is placed.
Dependencies are inferred from the claim text.