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US 10,704,945 B2Granted
Correction of natural gas flow calculations for the effects of water vapor
AssigneeRosemount Inc.
InventorsDavid Eugene Wiklund, Dale Scott Davis
Life of this patent
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Abstract
A system for measuring concentration of water vapor in a gas includes a pressure sensor configured to sense a static pressure of the gas and a differential pressure sensor configured to sense a differential pressure. A temperature sensor senses a temperature of the gas. Circuitry estimates determines a concentration of water vapor in the gas based upon the measured pressures and temperature.
Claims18
A system for measuring and correcting flow measurements of a gas containing saturated water vapor in process piping, comprising:
- a pressure sensor configured to sense a pressure of the gas in the process piping;
- a differential pressure sensor configured to sense a differential pressure related to flow of the gas;
- a temperature sensor configured to sense a temperature of the gas in the process piping;
- measurement circuitry configured to correct flow measurements of the gas by providing flow measurements of the gas compensated for saturated water vapor in the gas based upon the measured pressure, differential pressure and temperature wherein the flow measurements of the gas are compensated for saturated water vapor by correcting a mole fraction of a dry component of the gas based on a mole fraction of water vapor, using the corrected mole fraction of the dry component of the gas to determine a molecular weight of the gas with water vapor and using the molecular weight of the gas with water vapor to produce the flow measurements of the gas compensated for saturated water vapor;
- and
- a monitoring system providing the compensated flow measurements of the gas.
3 more elements
Dependencies are inferred from the claim text.