Exhaust gas after-treatment mixing device and package therefor
AssigneeTenneco (Suzhou) Emission System Co., Ltd.
InventorsCong Wang, Lin Wang, Ping Wang
Life of this patent
Estimating the term…
Loading patent…
AssigneeTenneco (Suzhou) Emission System Co., Ltd.
InventorsCong Wang, Lin Wang, Ping Wang
Estimating the term…
The present application discloses an exhaust gas after-treatment mixing device including a first plate, a second plate and a mixer. The mixer includes a first space, a second space and a third space located between the first space and the second space. Top portions of the first space and the second space are in communication with the third space. The mixer includes a first raised portion protruding into the third space and a second raised portion located below the first raised portion. A fourth space is formed between the first raised portion and the second raised portion. As a result, the distance and time of urea evaporation is increased and the mixing uniformity is improved. Besides, a package with the exhaust gas after-treatment mixing device is also provided.
An exhaust gas after-treatment mixing device, comprising:
An exhaust gas after-treatment package comprising a first after-treatment carrier assembly, a second after-treatment carrier assembly downstream of the first after-treatment carrier assembly, and a third after-treatment carrier assembly downstream of the second after-treatment carrier assembly, wherein the exhaust gas after-treatment package further comprises an exhaust gas after-treatment mixing device located between the second after-treatment carrier assembly and the third after-treatment carrier assembly, and the exhaust gas after-treatment mixing device comprises:
Dependencies are inferred from the claim text.